Bachelor’s thesis, master’s thesis or research laboratory
© IKVTopic of the work:
Plasma-enhanced chemical vapor deposition (PECVD) is an established process for the production of functional thin films for numerous applications in industry and research. The properties of the deposited layers are significantly influenced by the plasma source used. In a research environment, a carefully developed plasma source offers the potential to increase the reproducibility of research results enormously. Plasma concepts also offer the potential to increase process efficiency, improve coating quality and open up new fields of application.
The aim of this work is to develop, construct and investigate a novel plasma source for use in PECVD reactors. The focus is on the design of the plasma source, its integration into an existing coating system and the experimental characterization of the generated plasma. The aim is to evaluate the suitability of the concept for future coating processes and to create the basis for further process development.
The work is written in this working group:
The work is carried out in the Plasma and Surface Technology working group. The research activities of the working group include the development of plasma-assisted coating processes, the characterization of plasmas and the investigation of functional thin films and surfaces.
Scope of your thesis:
The aim of the work is the development and experimental investigation of a plasma source for PECVD applications. To this end, suitable design and operating parameters are to be identified, the plasma properties analyzed and the possible applications of the plasma source for coating processes evaluated.
Your task:
| For a Bachelor's thesis, you will work on the following tasks: | For a Master's thesis, you could also work on the following tasks: |
| Research on the state of the art of plasma sources for low-pressure and atmospheric pressure plasmas | Numerical or analytical consideration of relevant high-frequency properties |
| Conception and design of a plasma source | Optimization of the plasma source geometry and operating parameters |
| Support in the construction and integration into a PECVD reactor | investigation of the influence of the plasma source on layer growth and layer properties |
| Experimental investigation and characterization of the plasma | |
| Analysis and documentation of the results |
Your profile:
- Natural science or technical studies (physics, materials science, mechanical engineering, mathematics, etc.)
- Interest in plasma physics, vacuum technology and experimental research
- Independent and structured way of working
- Enjoy practical development work and working with measurement and system technology
- Experience in plasma and vacuum technology is an advantage, but not a prerequisite
Work can begin immediately. If you are interested, just get in touch!